2020 International Conference On Computer Aided Design

The Premier Conference Devoted to Technical Innovations in Electronic Design Automation

November 2-5, 2020VIRTUAL CONFERENCE

MP Associates, Inc.
MONDAY November 02, 8:30am - 9:00am | Slot 2
EVENT TYPE: REGULAR SESSION
SESSION 2B
Exploring Optimal Mask Patterns
Moderator:
Takashi Sato - Kyoto Univ.
Optical proximity correction (OPC) is a process that is widely applied in advanced nodes for manufacturability optimization. It is also the most expensive and difficult process in terms of computational efforts. The first paper in this session tackles this issue with a full chip scale, high-performance and salable OPC system based on deep learning. The second paper proposes an OPC framework that uses a neural network to perform end-to-end pattern prediction and inverse lithography-technology (ILT) based OPC framework. The third paper suggests improved printability through Lammellar directed self-assembly (DSA) with guiding template design.

2B.1DAMO: Deep Agile Mask Optimization for Full Chip Scale
 Speaker: Guojin Chen - Chinese Univ. of Hong Kong, Shatin, Hong Kong
 Authors: Guojin Chen - Chinese Univ. of Hong Kong, Shatin, Hong Kong
Wanli Chen - Chinese Univ. of Hong Kong, Shatin, Hong Kong
Yuzhe Ma - Chinese Univ. of Hong Kong, Shatin, Hong Kong
Haoyu Yang - Chinese Univ. of Hong Kong, Shatin, Hong Kong
Bei Yu - Chinese Univ. of Hong Kong, Shatin, Hong Kong
2B.2Neural-ILT: Migrating ILT to Neural Networks for Mask Printability and Complexity Co-optimization
 Speaker: Bentian Jiang - Chinese Univ. of Hong Kong, Hong Kong, Hong Kong
 Authors: Bentian Jiang - Chinese Univ. of Hong Kong, Hong Kong, Hong Kong
Lixin Liu - Chinese Univ. of Hong Kong, Hong Kong
Yuzhe Ma - Chinese Univ. of Hong Kong, Shatin, Hong Kong
Hang Zhang - Cornell Univ., Ithaca, NY
Bei Yu - Chinese Univ. of Hong Kong, Shatin, Hong Kong
Evangeline F.Y. Young - Chinese Univ. of Hong Kong, Shatin, Hong Kong
2B.3Guiding Template Design for Lamellar DSA with Multiple Patterning and Self-Aligned Via Process
 Speaker: An-Jie Shih - National Taiwan Univ. of Science and Technology, Taiwan
 Authors: An-Jie Shih - National Taiwan Univ. of Science and Technology, Taiwan
Shao-Yun Fang - National Taiwan Univ. of Science and Technology, Taipei, Taiwan
Yi-Yu Liu - National Taiwan Univ. of Science and Technology, Taipei, Taiwan